Papers & Patents (~2004):

2005
Refereed articles:

  1. K. Eguchi, H.J. Huang, M. Kambara, and T. Yoshida, Twin Hybrid Plasma Spray Deposition of Novel Thermal Barrier Ysz Composite Coatings, J JPN I MET, 69(1)17-22 (2005) ?
  2. H. Huang, K. Eguchi, M. Kambara, T. Yoshida, Novel zirconia composite coatings fabricated by twin hybrid plasma spraying, Mater. Sci. Forum, 475-479 2883-2886. (2005) (English)
  3. K. Nose, H.S. Yang, H. Oba, T. Yoshida, Defect-induced electronic conduction of tBN thin films, DIAMOND AND RELATED MATERIALS 14 (11-12) 1960-1963 NOV-DEC (2005)? (English)
  4. H.S. Yang, T. Yoshida, Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition, SURFACE & COATINGS TECHNOLOGY? 200 (1-4): 984-987 OCT 1 (2005)? (English)
  5. K. Nose, H.S. Yang, T. Yoshida, Electrical characterization of p-type cubic boron nitride/n-type silicon heterojunction diodes,? DIAMOND AND RELATED MATERIALS 14 (8) 1297-1301 AUG (2005)? (English)
  6. H. Yang, C. Iwamoto, Yoshida T, Peculiar deformation characteristics of turbostratic boron nitride thin film, THIN SOLID FILMS 483 (1-2) 218-221 JUL 1 (2005)? (English)
  7. K. Shinoda, Y. Kojima, and T. Yoshida, In-Situ Measurement System for Deformation and Solidification Phenomena of Plasma-Sprayed Zirconia Droplets, J. Therm. Spray. Techn., 2005.

Review articles:

1.???? 神原淳、吉田豊信; メゾプラズマCVDによる機能コーティングーシリコン薄膜の高速クラスター堆積?, 金属 vol.75 [3] (2005) 195.

Proceedings:

  1. M. Kambara, Y. Hamai, and T. Yoshida; X-ray scattering for in situ observation of nano sized silicon clusters during meso plasma fast rate epitaxy, 17th International Symposium on Plasma Chemistry, Toronto, Canada, 6-13 August p.846. (2005) (English)
  2. J. Li, H. Huang, K. Eguchi, M. Kambara, and T. Yoshida, Microstructure Investigation of Ysz Thermal Barrier Coatings Fabricated by Thermal Plasma Spraying. in 17th International Symposium on Plasma Chemistry. 2005. Toronto, Canada. (2005) (English)
  3. T. Ma, M. Kambara, K. Eguchi, and T. Yoshida., Effects of Microstructure on Reflectance of Thermal Barrier Coatings. in 17th International Symposium on Plasma Chemistry. 2005. Toronto, Canada. (2005) (English)
  4. K. Shinoda and T. Yoshida, Deformation and Solidification Process of Single Sprayed Zirconia Droplets Impinging on Substrate - in-Situ Measurement and Numerical Simulation. in 17th International Symposium on Plasma Chemistry. 2005. Toronto, Canada. (2005) (English)
  5. H. Huang, K. Eguchi, M. Kambara, and T. Yoshida. Development of Novel Thermal Barrier Coatings by Twin Hybrid Plasma Spraying. in the Third International Symposium on Nanotechnology. 2005. Tokyo, Japan. (2005) (English)
  6. H.J. Huang, K. Eguchi, M. Kambara, and T. Yoshida, Novel Zirconia Composite Coatings Fabricated by Twin Hybrid Plasma Spraying. Pricm 5: The Fifth Pacific Rim International Conference on Advanced Materials and Processing, Pts 1-5, 475-479, 2005, p. 2883-2886. (2005)
  7. H. Huang, J. Li, T. Ma, K. Eguchi, and T. Yoshida. Development of Composite Nano-Coatings by Comprehensive Thermal Plasma Deposition. in International Thermal Spray Conference and Exposition 2006. 2006. Seattle, USA. (2005) (English)

Conferences(#:Invited talk):

  1. K. Nose, H. Oba, T. Yoshida, Non- ohmic conduction up to 770 K in BN thin films deposited by phase- regulated RF bias sputtering in an ultra- high vacuum ambient, The 10th International Conference on New Diamond Science and Technology』00054, Tsukuba, April 2005 (2005) (English)
  2. H. Oba , K. Nose and T. Yoshida, Fabrication of heteroepitaxial Si films on sapphire substrate using mesoplasma CVD, The 5th? Asian-European International Conference on Plasma Surface Engineering ThP509, China, Sep 2005(2005) (English)
  3. M. Kambara,Y. Hamai, H. Yagi, T. Yoshida, High rate epitaxy of silicon by mesoplasma CVD, The 5th Asian-European International Conference on Plasma Surface Engineering, China, Sep 2005(2005) (English)
  4. M. Sawayanagi, J.M.A. Diaz, M. Kambara and T. Yoshida, Fabrication of heteroepitaxial Si films on sapphire substrates using mesoplasma CVD, The 5th Asian-European International Conference on Plasma Surface Engineering, China, Sep 2005(2005) (English)
  5. K. Nakamura, K. Nose, Y.S. Yang and T. Yoshida,The 5th? Asian-European International Conference on Plasma Surface Engineering ThP509, China, Sep 2005(2005) (English)
  6. 野瀬健二、吉田豊信、スパッタおよびCVDによるcBN薄膜堆積と電気伝導特性評価、応物学会/秋季シンポジウム講演、No9132徳島 （05年9月）
  7. T. Yoshida; Toward a new era of plasma spray processing, 17th International Symposium on Plasma Chemistry, Toronto, Canada, 6-13 August p.846. (2005) (English)
  8. M. Kambara, Y. Hamai, and T. Yoshida; X-ray scattering for in situ observation of nano sized silicon clusters during meso plasma fast rate epitaxy, 17th International Symposium on Plasma Chemistry, Toronto, Canada, 6-13 August p.846. (2005) (English)
  9. J. Li, H. Huang, K. Eguchi, M. Kambara, and T. Yoshida, Microstructure Investigation of Ysz Thermal Barrier Coatings Fabricated by Thermal Plasma Spraying. in 17th International Symposium on Plasma Chemistry.. Toronto, Canada. (2005) (English)
  10. T. Ma, M. Kambara, K. Eguchi, and T. Yoshida., Effects of Microstructure on Reflectance of Thermal Barrier Coatings. in 17th International Symposium on Plasma Chemistry.. Toronto, Canada. (2005) (English)
  11. K. Shinoda and T. Yoshida, Deformation and Solidification Process of Single Sprayed Zirconia Droplets Impinging on Substrate - in-Situ Measurement and Numerical Simulation. in 17th International Symposium on Plasma Chemistry. Toronto, Canada. (2005) (English)
  12. K. Nose, H. Oba, T. Yoshida, Zinc-doped nano-crystalline boron nitride thin films with semiconducting properties, The 3rd International symposium on Frontier of Nanochemistry and Nanomaterials, Tokyo Oct, 2005
  13. K. Nose, T. Yoshida, Gallium Nitride in Court, Boron Nitride in Lab, Tinsghua University- University of Tokyo Stundent Forum 2005, Tokyo, (Sep.2005).
  14. M. Kambara, Y. Yamada, Y. Kojima and T. Yoshida, Effect of micropatterned substrates on deformation of molten alumina droplet, Materials Research Society Fall Meeting, (Boston, USA, Nov 2005)
  15. # 神原淳、メゾプラズマCVDによる高速エピタキシー、東京大学COE第2回合同シンポジウム、（東大、2005年6月）
  16. # T. Yoshida, Yamaguchi (Japan, Nov 2005)
  17. # T. Yoshida, cBN films, (China, April 2005)
  18. Nose K and Oba H and yoshida T, International conference of new diamond science and technology ICNDST-10 (Tsukuba, June 2005)
  19. T. Yoshida, Tokyo-Tsinhua Univ. forum,? Beijing (May, 2005)
  20. K. Nose, Tokyo-Tsinhua Univ. student forum,? Beijing (May, 2005)


Awards:

  • ?ナノコーティングプロジェクト、“最優秀技術賞”, ナノテク2005, ビックサイト、東京（2005年3月）
2004

Refereed articles:

  1. Yang HS, Iwamoto C, Yoshida T,High-resolution transmission electron microscopy of as-deposited boron nitride on the edge of ultrathin Si flake, J. Appl. Phys. 95(5) (2004) 2337-2341.
  2. T. Mizuki, J. Matsuda, J, Takagi, T. Yoshida, Large domains of continuous grain silicon on glass substrate for high performance thin film transistor, IEEE T. Electron Dev,51 (2) 204-211 (2004)
    Review articles:
  1. M. Kambara and T. Yoshida, Evolution of thermal plasma processing, JEOL Journal, vol.36 (2004) 8-15? (Japanese)
  2. 神原淳、吉田豊信, 熱プラズマプロセシング、 真空ジャーナル、96 (2004) 3 .
    Proceedings:
  1. K. Shinoda, A. Yamada, T. Koseki, and T. Yoshida, In-situ measurement of sprayed ceramics particles and supercooling effects on splat morphology, Proc. of International Thermal Spray Conference, 2004 (English)
  2. H. Huang, K. Eguchi, T. Yoshida, in International Thermal Spray Conference & Exposition 2004 (Osaka, Japan, 2004).

Conferences (#:Invited talk):

  1. K. Shinoda, A. Yamada, T. Koseki, and T. Yoshida, In-situ measurement of sprayed ceramics particles and supercooling effects on splat morphology, International Thermal Spray Conference, 2004 (English)
  2. H. Huang, K. Eguchi, T. Yoshida, in International Thermal Spray Conference & Exposition 2004 (Osaka, Japan, 2004).
  3. H. Huang, K. Eguchi, M. Kambara, T. Yoshida, in the Fifth Pacific Rim International Conference on Advanced Materials and Processing (Beijing, China, 2004).
  4. M. Kambara, H. Yagi, Y. Hamai and T. Yoshida, Mesoplasma CVD for ultrafast deposition of various Si thin films, Gordon Research Conference ? Plasma Processing Science (MA, USA, 2004)
  5. Y.S. Yang, T. Yoshida, Plasma Surface Engineering, (Garmisch, Germany, Sept 2004)
  6. Zarzar Matsushita, K. Nose, T. Yoshida, Plasma Surface Engineering, (Garmisch, Germany, Sept 2004)
  7. #?? M. Kambara, クラスターその場計測とシリコン薄膜の高速エピタキシャル成長、第19回マテリアル研究セミナー(Tokyo, Nov 2004)
  8. #?? T. Yoshida, Plasma Coating Processes, International Thermal Spray Conference, (May 2004)
  9. #?? 吉田豊信、プラズマ薄膜・コーティングプロセシングー材料分野からの挑戦、東北大学（April 2004）
  10. # T. Yoshida, NEDO Nano Coating Project: Outline and Achievements, ICMEN2004, F4D2, (Canada,June 2004 )
  11. K. Nose, H. Oba and T. Yoshida, International conference of new diamond science and technology ICNDST-9東京（2004年4月）?

Awards:

  1. 吉田豊信、日本学術振興会　第153委員会　プラズマ材料科学賞、2004年2月
  2. 神原淳、第25回　本多記念奨励賞、2004年5月
  3. 篠田健太郎、Asian Promising Researcher, International Thermal Spray Conference 2004, Osaka、2004年5月

Articles (2003)

S. A. Kulinichi, T. Yoshida, H. Yamamoto and K. Terashima; Thermal plasma fabricated lithium niobate-tantalate films on sapphire substrate, J. Vac. Sci. Technol. A 21 [4] 994-1003 (2003) (English)

X.H. Wang, A. Yamamoto, K. Eguchi, H. Obara and T. Yoshida; Thermoelectric properties of SiC thick films deposited by thermal plasma physical vapor deposition, Sci. Tech. Adv. Mater. 4 [2] 167-172 (2003) (English)

X.H. Wang, K. Eguchi, C. Iwamoto and T. Yoshida; Ultrafast thermal plasma physical vapor deposition of thick SiC films, Sci. Tech. Adv. Mater. 4 [2] 159-165 (2003) (English)

H. Huang , K. Eguchi and T. Yoshida; Novel structured yttria-stabilized zirconia coatings fabricated by hybrid thermal plasma spraying, Science and Technology of Advanced Materials, 4(6) (2003) 617-622

Yang HS, Yoshida T, Mass spectrometric study of low-pressure inductively coupled plasma for chemical vapor deposition of cubic boron nitride films, Science and Technology of Advanced Materials, 4(6) (2003) 613-616

H. Yang, C. Iwamoto, and T. Yoshida; Interface engineering of cBN films deposited on silicon substrates, J. Appl. Phys. 94 (2) 1248-1251 (2003) (English)

C. Iwamoto, H.S. Yang, S. Watanabe, and T. Yoshida; Dynamic and atomistic deformation of sp2-bonded boron nitride nanoarrays, Appl. Phys. Lett. 83 (21) 4402-4404 (2003) (English)

D.A. Cardwell, H.B. Nadendla, M. Kambara, Y. Shi, C.D. Tarrant, and K.R. Schneider; Improved-trapped magnetic fields in top seeded melt grown YBCO superconductor doped with depleted and enriched uranium oxide, Mater. Sci. Forum 426 [4] 3499-3504 (2003) (English)

N.H. Babu, M. Kambara, Y. Shi, D.A. Cardwell, C.D. Tarrant, K.R. Schnider; Development of the microstructure of uranium-doped Nd-Ba-Cu-O, IEEE Trans. Appl. Supercond. 13 [2] 3147-3150 (2003) (English)

M. Kambara, H.B. Nadendla, D.A. Cardwell and A.M. Campbell; Solidification path of (Y,Nd)123 superconducting oxides; Supercond. Sci. Technol. 16 [11] 1268-1293 (2003) (English)

N.H. Babu, M. Kambara, Y. Shi, D.A. Cardwell, C.D. Tarrant, K.R. Schnider; The chemical composition of uranium-containing phase3 particles in U-doped Y-Ba-Cu-O melt processed superconductor, Physica C 392 110-115 (2003) (English)

K. Nose, K. Tachibana, T. Yoshida; Rectification properties of layered boron nitride films on silicon, Appl. Phys. Lett. vol. 83 (5) 943-945 (2003) (Engilish)

Proceeding (since 2003)

K. Nose and T. Yoshida, Mechanisms of electronic conduction metal/semiconducting cBN/insulating tBN junction diodes, 16th International Symposium on Plasma Chemistry, , Taormina, Italy, 22-27 June 2003, po6.32 (2003) (English)

H. Yang, C. Iwamoto and T. Yoshida, In situ mass and energy measurment of chemical species responsible for cBN growth by ICP-CVD, 16th International Symposium on Plasma Chemistry, Taormina, Italy, 22-27 June 2003, po8.45 (2003) (English)

K. Shinoda, R. Takenoshita, Y. Kojima and T. Yoshida, In situ measurement system for correlating splat morphology and solidification process under plasma spraying conditions, 16th International Symposium on Plasma Chemistry, Taormina, Italy, 22-27 June 2003, po12.39 (2003) (English)

M. Kambara, T. Chiba, Y. Hamai, K. Eguchi and T. Yoshida, Growth of crystalline Si thin film at ultra-fast deposition rate via hybrid thermal plasma CVD, 16th International Symposium on Plasma Chemistry, Taormina, Italy, 22-27 June 2003, po10.20 (2003) (English)

H. Huang, K. Eguchi and T. Yoshida, Twin hybrid plasma spraying of thermal barrier coatings, 16th International Symposium on Plasma Chemistry, Taormina, Italy, 22-27 June 2003, Or12.5 (2003) (English)

T.Yoshida; NEDO Nano-Coating project, A Symposium on thermal spray coatings in 101st Annual techinical forum of the Canadian Ceramic society, 8 Sept 2003 (Toronto,Canada) (2003) (English)

T.Yoshida, Growth and Transport of Clusters in Maso Plasma Vapor Deposition, XVth Int. Sympo. on the reactivity of Solids, 9 Nov, 2003 (Kyoto) (2003) (English)

T.Yoshida and M.Kambara, Ultrafast deposition of Si thick films by TP-CVD for photovoltaic solar cells, Asia-European International Conference in Plasma Surface Engineering 2003, 28 Sep - 2Oct 2003 (Jeju,Korea) (2003) (English)

Heji Huang, Keisuke Eguchi, Toyonobu Yoshida; Twin hybrid plasma spraying of thermal barrier coatings, Symposium on Plasma Science and Materials 16, 4 - 5 June 2003 (Tokyo) (2003) (English)

M.Kambara, Y.Hamai, K.Eguchi and T.Yoshida, Crystalline Si thin films for photovoltaic solar cells synthesized by thermal plasma CVD, Symposium on Plasma Science and Materials 16, 4 - 5 June 2003 (Tokyo) (2003) (English)

K. Nose and T. Yoshida, Rectification properties of n-Si/intrinsic p-BN heterojunction prepared by phase-regulated RF bias sputtering, International Symposium on 16th SYMPOSIUM ON PLASMA SCIENCE FOR MATERIALS, Tokyo, Japan, 4-5 June 2003, B2-4 (2003) (English)

Press Release (since 2003)
微粒子と平面結晶 交互に重ね合金 東大,プラズマ使い耐熱性, 日経産業新聞, 2003年5月23日付　(2003) (Japanese)

Articles (2002)

S. A. Kulinich, H. Yamamoto, J. Shibata, K. Terashima, T. Yoshida, Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD, Thin Solid Films, 407, 60-66(2002) (English)

J. Shibata, S. A. Kulinich, H. Yamamoto, K. Terashima, T. Yamamoto, T. Yoshida, and Y. Ikuhara, Transmission Electron microscopic studies of LiNb0.5Ta0.5O3 thin films deposited on sapphire substrates by thermal plasma spray CVD, Mater. Trans. JIM, 43(7), 1517-1524 (2002) (English)

P. Han and T. Yoshida, Numerical investigation of thermophoretic effects on cluster transport during thermal plasma deposition process, J. Appl. Phys., 91(4), 1814-1818 (2002) (English)

H.Yang, C. Iwamoto and T. Yoshida, High-quality cBN thin films prepared by plasma chemical vapor deposition with time-dependent biasing technique, Thin Solid Films, 407(1-2), 67-71 (2002) (English)

Y. Yamada-Takamura and T. Yoshida, Ion imolantation effects on the structure and nanomechanical properties of vapor deposited cubic boron nitride films, J. Vac. Sci. and Tech. B, 20(3), 936-939 (2002) (English)

H. Yang, C. Iwamoto and T. Yoshida, 　Nanostructures of the turbostratic BN transition layer in cubic BN thin films deposited by low-pressure inductively coupled plasma-enhanced chemical vapor deposition, J. Appl. Phys., 91(10), 6695-6699 (2002) (English)

P. Han and T. Yoshida, Growth and transport of clusters in thermal plasma vapor deposition of silicon, J. Appl. Phys., 92(8), 4772-4779 (2002) (English)

M. Kambara, H. B. Nadendla, Y. Shi and D. A. Cardwell; High temperature phase relationships in (Y,Nd)123 superconducting oxides: The Y2BaCuO5 - Nd4Ba2Cu2O10 - Ba3Cu5O8 system, Supercond. Sci. Technol., 15[5] 708-711 (2002) (English)

M. Kambara, H. B. Nadendla, D. A. Cardwell and A. M. Campbell; Joining of the melt-textured Nd-Ba-Cu-O superconducting oxides, Physica C, 372[2] 1155-1158 (2002) (English)

H. B. Nadendla, M. Kambara, Y. Shi, D. A. Cardwell, C. D. Tarrant, K. R. Schneider; Processing and microstructure of single grain, uranium doped YBCO superconductor; Supercond. Sci. Technol., 15[1] 104-110 (2002) (English)

M. Eisterer, M. Zehetmayer, S. Tonies, H. W. Weber, M. Kambara, D. A. Cardwell and L. R. Greenwood; Newtron irradiation of MgB2 bulk superconductors, Supercond. Sci. Technol., 15[2] L9-L12 (2002) (English)

D. A. Cardwell, A. D. Bradley, N. H. Babu, M. Kambara and W. Lo; Processing, microsturcture and characterisation of artificial joins in top seeded melt grown YBCO, Supercond. Sci. Technol., 15[5] 639-647 (2002) (English)

H. B. Nadendla, M. Kambara, D. A. Cardwell and A. M. Campbell; Effect of oxygen content variation on flux pinning in Nd-Ba-Cu-O top seeded melt grown superconductor, Supercond. Sci. Technol., 15[5] 702-707 (2002) (English)

H. B. Nadendla, M. Kambara, D. A. Cardwell, C. D. Tarrant and K. Schneider; Effect of the addition of depleted UO2 on the microstructure of melt processed YBCO superconductors, Physica C, 372[2] 1183-1186 (2002) (English)

D. A. Cardwell, H. B. Nadendla,M. Kambara and A. M. Campbell; Magnetic properties and critical currents of bulk MgB2 polycrystalline superconductor, Physica C, 372[2] 1262-1265 (2002) (English)

G. Yassin, I. Barboy, V. Dikovsky, M. Kambara, D.A. Cardwell, S. Withignton, G. Jung, Microwave transmission through high-temperature superconducting waveguides, Physica C, 372[1] 523-525 (2002) (English)

Articles (2001)

S. A. Kulinich, J. Shibata, H. Yamamoto, Y. Shimada, K. Terashima, T. Yoshida, Highly c-axis oriented LiNb0.5Ta0.5O3 thin films on Si substrates fabricated by thermal plasma spray CVD. Appl. Surf. Sci.,182(1-2), 150-158 (2001)

H. Koga, Y. Nakamura, S. Watanabe, T. Yoshida, Molecular dynamics study of deposition mechanism of cubic boron nitride. Sci. & Technol. Adv. Mater., 2(2), 349-356 (2001)

P. Han and T. Yoshida, Modeling of clusters deposition under the effect of thermophoresis during thermal plasma flash evaporation process, Sci. & Tech. Adv. Mater., 2(2),367-374 (2001)

H. Koga, Y. Nakamura, S. Watanabe, T. Yoshida, Molecular dynamics study of the role of ion bombardment in cubic boron nitride thin film deposition., Surf. Coat. Technol., 142-144 , 911-915 (2001)

D. V. Shtansky, S. A. Kulinich, K. Terashima, T. Yoshida, Y. Ikuhara, Crystallography and structural evolution of LiNbO3 and LiNb1-xTaxO3 films on sapphire prepared by high-rate thermal plasma spray chemical vapor deposition. J. Mater. Res.,16(8), 2271-2279 (2001)

Y. K. Chae, H. Ohno, K. Eguchi, T. Yoshida, Ultrafast deposition of microcrystalline Si by thermal plasma chemical vapor deposition.　J. Appl. Phys.,89(12), 8311-8315 (2001)

T. Ohmura, S. Matsuoka, K. Tanaka, T. Yoshida, Nanoindentation load-displacement behavior of pure fcc. metal thin films on a hard substrate., Thin Solid Films.,385(1-2), 198-204 (2001)

T. Yoshida, Some Issues for the Development of Spraying Technology, 40(4),322-325(2001) (Japanese)
溶射プロセス高度化の要件, 吉田豊信, まてりあ 40(4),322-325(2001)

Y. Yamada-Takamura, H. Ichinose, T. Yoshida, HRTEM observation of phase evolution in vapor deposited cubic boron nitride film, Materia , 40(12), 1033. (2001) (Japanese)
立方晶窒化ホウ素膜成長に伴う相変化のHRTEM観察, 高村（山田）由起子、市野瀬英喜、吉田豊信, まてりあ40(12), 1033 (2001)

H. Matsubara, Y. Kagawa, T. Yoshida, Outline of the nanostructure coating project, Ceramics Japan, 36(9), 646-651(2001) (Japanese)
ナノコーティングプロジェクトの概要, 松原秀彰、香川豊、吉田豊信, セラミックス

M. Kambara, H. B. Nadendla, Y. Shi, D. A. Cardwell; Crystal growth of Nd-123 crystal in 1% oxygen partial pressure atmosphere, IEEE Trans. Appl. Supercond., 11 [1] 3442-3445 (2001)

M. Kambara, N. Hari Babu, Y. Shi, D. A. Cardwell; Growth of melt-textured Nd-123 by hot-seeding under reduced oxygen partial pressure, J. Mater. Res., 16 [4] 1163-1170 (2001)

M. Kambara, M. Yoshizumi, K. Miyake, K. Murata, T. Izumi, Y. Shiohara, T. Umeda; Role of the primary phase particles during the peritectic solidification of Y-123 superconductive oxides, J. Mater. Res., 16 [8] 2229-2238 (2001)

M. Kambara, N. Hari Babu, Y. Shi, D. A. Cardwell; High temperature phase relationships in (Y,Nd)123 superconducting oxides; Physica C, 357 649-653 (2001)

M. Kambara, N. Hari Babu, E. S. Sadki, J. R. Cooper, H. Minami, D. A. Cardwell, A. M. Campbell and I. H. Inoue; High intergranular critical currents in metallic MgB2 superconductor, Supercond. Sci. Technol. 14[4] L5-L7 (2001)

K.Uenishi, T. Matsubara, M. Kambara, K. F. Kobayashi, Nanostructured titanium-aluminides and their composites formed by combustion synthesis of mechanically alloyed powders, Scripta Materialia, 44 [8] 2093-2097 (2001)

H. B. Nadendla, M. Kambara, D. A. Cardwell, J. E. McCrone, J. R. Cooper; Fabrication of Ca-doped large grain Y-Ba-Cu-O superconductors, IEEE Trans. Appl. Supercond., 11[1] 3521-3524 (2001)

P. J. Smith, D. A. Cardwell, M. Kambara, H. B. Nadendla, Y. Shi; Preparation of doped precursor powders for the fabrication of large grain high temperature superconductors, Appl. Supercond., 11[1] 2850-2853 (2001)

D. A. Cardwell, M. Kambara, H. B. Nadendla, P. Smith, Y. Shi; Fabrication of large grain Nd-Ba-Cu-O by self-seeded melt growth, IEEE Trans. Appl. Supercond., 11[1] 3712-3715 (2001)

C. Panagopoulos, B. D. Rainford, T. Xiang, C. A. Scott, M. Kambara and I. H. Inoue; Penetration depth measurements in MgB2: Evidence for unconventional superconductivity, Phy. Rev. B, 64[9] 094514 (2001)

P. J. Smith, D. A. Cardwell, N. HariBabu, M. Kambara, Y. Shi; Self-seeded Melt Growth of Au-doped Nd-Ba-Cu-O, Supercond. Sci. Technol., 14[8] 624-630 (2001)

K. Kawano, J. S. Abell, M. Kambara, N. HariBabu, D. A. Cardwell; Evidence of high inter-granular current flow in single-phase polycrystalline MgB2 superconductor, App. Phys. Lett., 79[14] 2216-2218 (2001)

G. Yassin, G. Jung, V. Dikovsky, I. Barboy, M. Kambara, D. A. Cardwell and S. Withington; Investigation of microwave propagation in high-temperature superconducting waveguides, IEEE Microw. Wirel. Co. Lett., 11[10] 413-415 (2001)

A. Berenov, Z. Lockman, X. Qi, Y. Bugoslavsky, L. F. Cohen, M-H. Jo, N. A. Stelmashenko, V. N. Tsaneva, M. Kambara, N. Hari Babu, D. A. Cardwel, m. G. Blamire and J. L. MacManus-Driscoll; Growth of strongly biaxially alignied MgB2 thin films on sapphire by post-annealing of amorphous precursors, App. Phys. Lett., 79[24] 4001-4003 (2001)

Proceedings (2001)

Y. K. Chae, H. Ohno, K. Eguchi, T. Yoshida, Evaluation of microcrystalline silicon films deposited by ultrafast thermal plasma CVD. Materials Research Society Symposium Proceedings (2001),664(Amorphous and Heterogeneous Silicon-Based Films), A4.4.1-A4.4.6.

M. Kambara, N. Hari Babu, E. H. Sadki, J. R. Cooper, H. Minami, I. H. Inoue, D. A. Cardwell and A. M. Campbell, Strongly couple grain boundaries in MgB2 superconductors, SCENET - The European Network for Superconductivity and the supercurrent network Joint workshop on High current Superconductors for practical applications, Alpbach (Tyrol, Austria) June 8-10, 32 (2001)

M. Kambara, N. Hari Babu, Y. H. Shi and D. A. Cardwell, Solidification of (Y,Nd)123ss superconducting oxides, International Workshop on Processing and Applications of Superconducting (RE)BCO Large Grain Materials, University of Washington, Seattle, Washington USA, July 11-13, (2001)

M. Kambara, N. Hari Babu, E. H. Sadki, J. R. Cooper, H. Minami, D. A. Cardwell, A. M. Campbell and I. H. Inoue, High intergranular critical currents in metallic MgB2 superconductor, Institute of Physics - Superconductivity Annual Meeting, Birmingham (UK) March (2001)

Articles (2000)

Toyonobu Yoshida et al., Solid Oxide Fuel Cells and Thermal Plasma Technology, MRS Bulletin, 25 (2000) 38-42

Dmitry Shtansky, Osamu Tsuda, Yuichi Ikuhara and Toyonobu Yoshida, Crystallography and Structural Evolution of Cubic Boron Nitride Films during Bias Sputter Deposition, Acta Materials, 48 (2000) 3745-3759

Shtansky, D. V.; Yamada-Takamura, Y.; Yoshida, T.; Ikuhara, Y., Mechanism of nucleation and growth of cubic boron nitride thin films. Sci. Technol. Adv. Mater.,1(4)(2000)219-225

Chae, Y. K.; Mostaghimi, J.; Yoshida, T., Deformation and solidification process of a super-cooled droplet impacting on the substrate under plasma spraying conditions. Sci. Technol. Adv. Mater.,1(3)(2000)147-156

Shtansky, D. V.; Tsuda, O.; Ikuhara, Y.; Yoshida, T., Crystallography and structural evolution of cubic boron nitride films during bias sputter deposition. Acta Mater. ,48(14)(2000)3745-3759

Gitzhofer, Francois; Boulos, Maher; Heberlein, Joachim; Henne, Rudolf; Ishigaki, Takamasa; Yoshida, Toyonobu. , Integrated fabrication processes for solid-oxide fuel cells using thermal plasma spray technology, MRS Bull.,25(7)(2000)38-42

Articles (1999)

Tsuda, Osamu; Tatebayashi, Yoshinao; Takamura, Yukiko Yamada; Yoshida, Toyonobu, Effects of phase regulation on ion energy distribution in RF bias sputtering. Plasma Sources Sci. Technol.,8(3)(1999)392-396

Terashima, Kazuo; Taniguchi, Yoshimasa; Takamura, Yuzuru; Yoshida, Toyonobu, Scanning tunneling microscopy operating under a plasma environment. Thin Solid Films.,345(1)(1999)146-150

Yamaguchi, Norio; Sasajima, Yasushi; Terashima, Kazuo; Yoshida, Toyonobu, Molecular dynamics study of cluster deposition in thermal plasma flash evaporation. Thin Solid Films.,345(1)(1999)34-37

Yamada-Takamura, Yukiko; Tsuda, Osamu; Ichinose, Hideki; Yoshida, Toyonobu, Atomic-scale structure at the nucleation site of cubic boron nitride deposited from the vapor phase. Phys. Rev. B: 59(15)(1999)10351-10355ﾊ

Teii, Kungen; Yoshida, Toyonobu. Lower pressure limit of diamond growth in inductively coupled plasma. J. Appl. Phys.,85(3)(1999)1864-1870

Article Selections Before 1998

38.  Y. Takamura, N. Yamaguchi, K. Terashima, and T. Yoshida: "High-rate deposition of YBa2Cu3O7-x films by hot cluster epitaxy," J. Appl. Phys., 1998, 84(9), pp. 5084-5088.

37.  N. Yamaguchi, K. Terashima, and T. Yoshida: "Scanning tunneling microscopy of YBa2Cu3O7-x clusters deposited by plasma flash evaporation method," J. Mater. Sci. Lett., 1998, 17(24), pp. 2067-2069.

36.  K. Terashima, N. Yamaguchi, T. Hattori, Y. Takamura, and T. Yoshida: "High rate deposition of thick epitaxial films by thermal plasma flash evaporation," Pure Appl. Chem., 1998, 70(6), pp. 1193-1197.

35.  Y. Yamada, O. Tsuda, and T. Yoshida: "Microstructure and nanomechanical properties of cubic boron nitride films prepared by bias sputter deposition," Thin Solid Films, 1998, 316(1-2), pp. 35-39.

34.  N. Yamaguchi, T. Hattori, K. Terashima, and T. Yoshida: "High-rate deposition of LiNbO3 films by thermal plasma spray CVD," Thin Solid Films, 1998, 316(1-2), pp. 185-188.

33.  O. Tsuda, Y. Tatebayashi, Y. YamadaTakamura, and T. Yoshida: "Mass and energy measurements of the species responsible for cBN growth in rf bias sputter conditions," J. Vac. Sci. Technol. A-Vac. Surf. Films, 1997, 15(6), pp. 2859-2863.

32.  Y. Takamura, K. Hayasaki, K. Terashima, and T. Yoshida: "Cluster size measurement using microtrench in a thermal plasma flash evaporation process," J. Vac. Sci. Technol. B, 1997, 15(3), pp. 558-565.

31.  Y. Yamada, Y. Tatebayashi, O. Tsuda, and T. Yoshida: "Growth process of cubic boron nitride films in bias sputter deposition," Thin Solid Films, 1997, 295(1-2), pp. 137-141.

30.  N. Yamaguchi, K. Terashima, and T. Yoshida: "Scanning tunnelling microscopy of diamond deposition at the nanometre scale holes on highly orientated pyrolytic graphite," J. Mater. Sci. Lett., 1997, 16(8), pp. 626-628.

29.  K. Hayasaki, Y. Takamura, N. Yamaguchi, K. Terashima, and T. Yoshida: "Scanning tunneling microscopy of epitaxial YBa2Cu3O7-x films prepared by thermal plasma flash evaporation method," J. Appl. Phys., 1997, 81(3), pp. 1222-1226.

28.  Y. Takamura, K. Hayasaki, K. Terashima, and T. Yoshida: "The role of radicals and clusters in thermal plasma flash evaporation processing," Plasma Chem. Plasma Process., 1996, 16(1), pp. S141-S156.

27.  O. Tsuda, Y. Yamada, T. Fujii, and T. Yoshida: "Preparation Of Cubic Boron-Nitride Films By Radio-Frequency Bias Sputtering," J. Vac. Sci. Technol. A-Vac. Surf. Films, 1995, 13(6), pp. 2843-2847.

26.  S. Yuhya, K. Kikuchi, Y. Shiohara, K. Terashima, and T. Yoshida: "Superconducting Yba2cu3ox Films Prepared By Rf Plasma Flash Evaporation," J. Mater. Res., 1992, 7(10), pp. 2673-2679.

25.  K. Terashima, T. Akagi, H. Komaki, and T. Yoshida: "As-Grown Preparation Of High-Critical-Temperature Superconducting Y1ba2cu3o7-X Films By Radiofrequency Plasma Flash Evaporation," J. Appl. Phys., 1992, 71(7), pp. 3427-3430.

24.  Y. Takamura, Y. Hirokawa, H. Komaki, K. Terashima, and T. Yoshida: "Synthesis Of High-Tc Superconductive Oxide-Films By Plasma Flash Evaporation," Physica C, 1991, 190(1-2), pp. 122-123.

23.  K. Terashima, M. Kondoh, Y. Takamura, H. Komaki, and T. Yoshida: "Surface Modification Of Bi-Sr-Ca-Cu-O Films Deposited Insitu By Radio-Frequency Plasma Flash Evaporation With A Scanning Tunneling Microscope," Appl. Phys. Lett., 1991, 59(6), pp. 644-646.

22.  K. Terashima, H. Komaki, and T. Yoshida: "Synthesis Of High Transition-Temperature Superconducting Y-Ba-Cu-O Films By Radiofrequency Plasma Flash Evaporation," IEEE Trans. Plasma Sci., 1990, 18(6), pp. 980-984.

21.  K. Terashima, M. Kondoh, and T. Yoshida: "Fabrication Of Nucleation Sites For Nanometer Size Selective Deposition By Scanning Tunneling Microscope," J. Vac. Sci. Technol. A-Vac. Surf. Films, 1990, 8(1), pp. 581-584.

20.  Y. Mitsuda, T. Yoshida, and K. Akashi: "Development Of A New Microwave Plasma Torch And Its Application To Diamond Synthesis," Rev. Sci. Instrum., 1989, 60(2), pp. 249-252.

19.  H. Murakami, H. Nagai, T. Irokawa, T. Yoshida, and K. Akashi: "Super High-Rate Thermal Plasma Cvd Of Ceramics," Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi-Journal Of The Ceramic Society Of Japan, 1989, 97(1), pp. 49-55.

18.  T. Uesugi, O. Nakamura, T. Yoshida, and K. Akashi: "A Tandem Radio-Frequency Plasma Torch," J. Appl. Phys., 1988, 64(8), pp. 3874-3879.

17.  S. Takeuchi, T. Okada, T. Yoshida, and K. Akashi: "Development Of A Novel Spray Coating Technique With A Radio-Frequency Plasma Torch," J. Jpn. Inst. Met., 1988, 52(7), pp. 711-718.

16.  H. Murakami, T. Yoshida, and K. Akashi: "High-Rate Thermal Plasma Cvd Of Sic," Advanced Ceramic Materials, 1988, 3(4), pp. 423-426.

15.  W.X. Pan, T. Yoshida, and K. Akashi: "Study On Plasma Sintering," Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi-Journal Of The Ceramic Society Of Japan, 1988, 96(3), pp. 317-322.

14.  K. Terashima, K. Eguchi, T. Yoshida, and K. Akashi: "Preparation Of Superconducting Y-Ba-Cu-O Films By A Reactive Plasma Evaporation Method," Appl. Phys. Lett., 1988, 52(15), pp. 1274-1276.

13.  M. Mieno, T. Yoshida, and K. Akashi: "Preparation Of Boron-Nitride Films By Reactive Sputtering," J. Jpn. Inst. Met., 1988, 52(2), pp. 199-203.

12.  W.X. Pan, M. Sato, T. Yoshida, and K. Akashi: "Plasma Sintering Of Ultrafine Amorphous Si3n4," Advanced Ceramic Materials, 1988, 3(1), pp. 77-79.

11.  Y. Tamou, T. Yoshida, and K. Akashi: "The Synthesis Of Ultrafine Silicon-Carbide In A Hybrid Plasma," J. Jpn. Inst. Met., 1987, 51(8), pp. 737-742.

10.  Y. Mitsuda, Y. Kojima, T. Yoshida, and K. Akashi: "The Growth Of Diamond In Microwave Plasma Under Low-Pressure," Journal Of Materials Science, 1987, 22(5), pp. 1557-1562.

9.  S. Ashida, T. Yoshida, and K. Akashi: "Evolution Of Protrusions During Sputtering From Composite Ag-Si Targets," J. Vac. Sci. Technol. A-Vac. Surf. Films, 1986, 4(5), pp. 2388-2390.

8.  Y. Anekawa, T. Koseki, T. Yoshida, and K. Akashi: "The Co-Condensation Process Of High-Temperature Metallic Vapors," J. Jpn. Inst. Met., 1985, 49(6), pp. 451-456.

7.  S. Komatsu, T. Yoshida, and K. Akashi: "Chemical-Transport Of Boron In A Low-Pressure Hydrogen Plasma," J. Mater. Sci. Lett., 1985, 4(1), pp. 51-54.

6.  T. Yoshida, T. Tani, H. Nishimura, and K. Akashi: "Characterization Of A Hybrid Plasma And Its Application To A Chemical Synthesis," J. Appl. Phys., 1983, 54(2), pp. 640-646.

5.  T. Harada, T. Yoshida, T. Koseki, and K. Akashi: "Co-Condensation Process Of High-Temperature Metallic Vapors," J. Jpn. Inst. Met., 1981, 45(11), pp. 1138-1145.

4.  T. Yoshida and K. Akashi: "Preparation Of Ultrafine Iron Particles Using An Rf Plasma," Transactions Of The Japan Institute Of Metals, 1981, 22(6), pp. 371-378.

3.  T. Yoshida, A. Kawasaki, K. Nakagawa, and K. Akashi: "Synthesis Of Ultrafine Titanium Nitride In An Rf Plasma," Journal Of Materials Science, 1979, 14(7), pp. 1624-1630.

2.  T. Yoshida and K. Akashi: "Particle Heating In A Radio-Frequency Plasma Torch," J. Appl. Phys., 1977, 48(6), pp. 2252-2260.

1.  K. Akashi and T. Yoshida: "Formation Of Metal-Oxides By Use Of Radio-Frequency Plasma - Synthesis Of Silica Glass Of High-Purity," Denki Kagaku, 1976, 44(3), pp. 140-150.

Patents

マイクロ波熱プラズマ・トーチ　特許2527150号（1996）吉田豊信、光田好

複合プラズマによる酸化物皮膜の形成方法　特許2093857号（1996）吉田豊信　他

プラズマ反応法による有機ハロゲン化合物の分解装置　特許2642200号（1997）吉田豊信、小牧久

高周波誘導プラズマによる有機ハロゲン化合物の分解方法及びその装置　特許2732472号（1998）吉田豊信、小牧久

熱プラズマ蒸発法による成膜方法　特許2806548号（1998）吉田豊信、小牧久

熱プラズマCVDによるシリコン薄膜の堆積方法及びその装置 2000/8/7 吉田豊信、江口敬祐、チェヨンキ、大野浩賢

熱プラズマを用いた成膜装置 2001/2/19 吉田豊信

熱プラズマCVDによるシリコン薄膜の堆積方法及びその装置 (2001/2/23) USA 吉田豊信、チェヨンキ、大野浩賢、江口敬祐

 

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